Styles from the Epson Digital Couture Project

To celebrate new developments in its dye sublimation technology, particularly its new High Density Black ink, Epson America Inc. hosted its second annual Digital Couture Project the evening before the official start of New York Fashion Week. Bringing together 11 designers from the United States and Latin America, the show, held in the trendy Chelsea neighborhood of Manhattan, showcased complete fashion looks all printed on Epson dye sublimation machines.

Epson first launched its line of dye sublimation machines in 2013. Since then, they’ve taken heed of customer feedback and made marked improvements to the technology, most notably with its proprietary High Density Black ink that offers deep saturation.

The designers featured at the 2016 event were tasked with putting together complete dye sublimated looks that followed the theme of “Harmony & Peace through Fashion.” A jury made up of Epson representatives and fashion professionals chose the final 11 designers who would bring their work to the Big Apple.

Check out a few of the looks featured at the Epson Digital Couture Project: